Other deposition processes have been explored for a-Si films. Here only those are listed for which solar cell results were reported. These include
(1) reactive sputter deposition from silicon targets using a mixture of hydrogen and argon (Moustakas et al. 1985);
(2) photo-CVD using ultraviolet excitation and mercury sensitization (Konagai et al. 1987; Rocheleau et al. 1987a, 1987b);
(3) remote plasma chemical vapor deposition (Park et al. 1988);
(4) electron cyclotron resonance (ECR) microwave deposition (Sakamoto 1977; Dalal et al. 1997); and
(5) gas jet deposition (Jones et al. 2000).
These depositions yielded worse a-Si films or solar cells, or they could not be easily scaled to provide large-area uniform films, and therefore, are not used in large-scale a-Si PV production.
